Equipment
Epitaxy
MBE: 2 x Riber32
MOVPE: 2 x Aixtron
HVPE: Aixtron
Lithography
Electron beam lithography: Leica EBPG 5 HR
Maskaligner: 2 x Süss MJB3, 1X Süss MJB4
Flood exposure: OAI DUV
Etching
Barreletch: Plasmalab µ-etch
ECR: Oxford 80
ICP: Oxford 100
Vapour Deposition
Temescal FC 1800
Balzers PLS 570
Leybold QE 1200
Leybold
Edwards 306 Cryo
Sputtering
Perkin Elmer 2400
Baltec SCD 050
PECVD
Oxford Plasma Technology
Characterization
Needle Probe Süss PM5
Ellipsometer Gärtner
Magnetoresistant Tencor m-gage
Surface profil: 1 x Tencor AlphaStep, 1 x Bruker Dektak
Microscopes: Reichert Jung Polyvar, Nikon Mikrophot FXA, Leica M32
Confocal microscope: Keyence
REM: Hitachi S4000, Hitachi S5000
X-ray diffractometer: Siemens HXRD D5000, Bruker
Other
Rapid Thermal Annealing AST