Model: Fischione Ion Mill 1010 High Mag
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions
Model: Fischione Ion Mill 1010 High Mag
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions