Model: Fischione Ion Mill 1010 High Mag
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions
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Model: Fischione Ion Mill 1010 High Mag
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions