Model: Techno Org Linda IV 2
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions
![Techno Org Linda IV 2](/fileadmin/_migrated/pics/linda.jpg)
Model: Techno Org Linda IV 2
Purpose: Thinning upto nanometerthicknessof TEM samples for TEM investigation
Description: upto 6kV Ar ion removesurface atoms by sputtering process under high vaccuum conditions